Semiconductor Device Characterization Facility

The semiconductor device characterization facility has been established for detailed wafer-level characterization (I-V, C-V, pulse, noise and reliability measurements). This facility has the following equipment: a 6-inch wafer probe station with thermo chuck (Semiprobe), semiconductor parametric analyzer B1500 with 4 SMUs, 1 LCR meter, 1 pulse unit (Agilent), dynamic signal analyzer 35670A (Agilent), low-noise current preamplifier (Stanford Research Systems), ICCAP modelling software (Agilent), manual diamond scriber (ATV). This facility will be extensively used for semiconductor device/circuit research, semiconductor device modelling and electrical characterization of nanostructures.